NAURA Secures Volume Orders for High-k Atomic Layer Deposition Equipment
Recently, NAURA's 12-inch high dielectric constant atomic layer deposition (ALD) tool, Scaler HK430, has achieved stable mass production, securing bulk orders and steadily increasing its market share while gaining strong customer trust. This milestone marks the successful application of NAURA's advanced CVD (chemical vapor deposition) process equipment solutions and injects new momentum into the company's expansion within the high-end equipment sector.
To overcome transistor scaling bottlenecks, the industry has widely adopted the novel High-k material HfO₂ (hafnium oxide) as the gate dielectric layer, paired with metal gate technology to develop the HKMG (High-K/Metal Gate) process. This technology dominates critical nodes at 45 nm and below, making CVD/ALD process equipment indispensable to HKMG manufacturing. Building on years of ALD technology expertise, NAURA launched the 12-inch High-k ALD system Scaler HK430, which, leveraging its superior performance, production capacity, and proven deployments in leading domestic 12-inch fabs, has become a flagship tool for mass production on High-k process lines within China.
The Scaler HK430 utilizes a cross-flow gas delivery system, ensuring enhanced process stability control. Its rotating heater base design achieves superior film uniformity and exceptional particle control. Structurally, the tool features a single-wafer-per-chamber configuration, delivering outstanding gas flow uniformity and temperature regulation, greatly enhancing consistency across wafers. Moreover, the tool employs a dual-source bottle system for reactants, enabling higher uptime. The source bottles use vacuum heating for precise temperature control and improved safety, offering particle control performance superior to comparable products. On the software front, the fully automated process flow, integrated data monitoring, and safety interlocks provide an optimal environment for stable mass production, granting higher safety and reliability compared to peers. The equipment finds broad application across logic and DRAM manufacturing sectors.
Looking ahead, NAURA remains steadfast in accelerating its technological innovation, advancing the development and deployment of cutting-edge CVD process equipment to meet the semiconductor industry's diverse technological demands, and elevating semiconductor manufacturing technology to new heights.
