Powering Semiconductor Synergy, Meet NAURA at CSTIC 2022
Exhibition Venue： Online Cloud platform
Exhibition Date：June 14-July 12, 2022
The China Semiconductor Technology International Conference (CSTIC 2022) will be held online via the SEMI Cloud platform from June 14 to July 12. Nearly 100 leading experts from around the world will gather to share cutting-edge advancements across a broad range of topics, including IC design, devices and integration, lithography, etching, CMP, packaging and testing, and compound semiconductors.
Senior experts from NAURA will present their latest achievements in advanced etching technologies at Subforum 3–Dry & Wet Etch and Cleaning. We sincerely invite you to join us in exploring the frontiers of etch technology—driving progress across the industry and unlocking boundless possibilities together.
NAURA Speaking Schedule:
-Symposium III: Dry & Wet Etch and Cleaning-
Session III: FEOL/MOL Etching
Topic: Bitline Etch Process Development for 1y nm DRAM Manufacturing
Speaker: Mr. Yao Xingjun
Session III: FEOL/MOL Etching
Topic: 200/150/100mm Compatible, ICP/CCP Etch Total Solutions
Speaker: Dr. Zhang Yiming
Session IV: Plasma Source and Wet Etch/Clean
Topic: SADP etch process development using PR core for sub 17nm DRAM
Speaker: Mr. Xu Litian
Session V: BEOL Etching and Memory Etch
Topic: Hard mask etch process development for patterning 60nm magnetic tunnel junction
Speaker: Ms. Li Xiaohui
Session VI: Other Etch and Patterning
Topic: Trench Etch for SiC Power Devices
Speaker: Mr. Xie Qiushi
